EPR of silica and fluoride glasses implanted with titanium and zirconium

Optical Materials

Volumn 19, Issue 2, 2002, Pages 295-306

  Aboukas, A ^a   Bogomolova, L D ^b   Deshkovskaya, A A ^c   Jachkin, V A ^b   Krasil'nikova, N A ^d   Prushinsky, S A ^b   Trul, O A ^d   Stefanovsky, S V ^d   Zhilinskaya, E A ^a  

^a UNIVERSITÉ DU LITTORAL CÔTE D OPALE   (France)

^b MOSCOW STATE UNIVERSITY   (Russian Federation)

^c Minsk Radiotechnique Institute   (Belarus)

^d State Corporation Radon   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

DOPING (ADDITIVES); FLUORINE COMPOUNDS; GROUND STATE; ION IMPLANTATION; LIGHT ABSORPTION; PARAMAGNETIC RESONANCE; SILICA; SPUTTERING; SUBSTRATES; TITANIUM; ZIRCONIUM;

FLUORIDE GLASS;

OPTICAL GLASS;

EID: 0036533004     PISSN: 09253467     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-3467(01)00226-9     Document Type: Article

References (50)

1. Chemical sputtering