Properties of grain boundaries in laser-crystallized silicon thin films

Journal of Non-Crystalline Solids

Volumn 299-302, Issue , 2002, Pages 726-730

  Eisele, C ^a   Bach, T ^a   Nebel, C E ^a   Stutzmann, M ^a  

^a WALTER SCHOTTKY INSTITUT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CRYSTALLIZATION; DIFFUSION; GRAIN BOUNDARIES; GRAIN GROWTH; HOLOGRAMS; INDUCED CURRENTS; LASER APPLICATIONS; LASER BEAM EFFECTS;

LASER CRYSTALLIZATION;

THIN FILMS;

EID: 0036531794     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(01)00978-4     Document Type: Article

References (10)