The effects of metallic underlayers on magnetic properties of obliquely sputtered Co thin films

Journal of Magnetism and Magnetic Materials

Volumn 242-245, Issue PART I, 2002, Pages 374-377

  Nguyen, L T ^a   Lisfi, A ^a   Lodder, J C ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

Magnetic anisotropy; Magnetic coupling; Magnetron sputtering; Thin film

Indexed keywords

COBALT; MAGNETIC ANISOTROPY; MAGNETRON SPUTTERING; MICROSTRUCTURE; SPUTTERING;

METALLIC UNDERLAYERS;

MAGNETIC THIN FILMS;

EID: 0036531162     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0304-8853(01)01163-5     Document Type: Article

References (7)