Surface oxidation of a Nb(100) single crystal by scanning tunneling microscopy

Materials Characterization

Volumn 48, Issue 2-3, 2002, Pages 163-167

  Li, Y ^a,b   An, B ^a   Fukuyama, S ^a   Yokogawa, K ^a   Yoshimura, M ^c  

^a AIST Chugoku   (Japan)

^b TIANJIN UNIVERSITY   (China)

^c TOYOTA TECHNOLOGICAL INSTITUTE   (Japan)

Author keywords

Niobium; Oxidation; Purification; Scanning probe microscopy; Surface

Indexed keywords

ANNEALING; IONS; NIOBIUM; OXIDATION; PURIFICATION; SCANNING TUNNELING MICROSCOPY; SEGREGATION (METALLOGRAPHY); SPUTTERING; SURFACE STRUCTURE; THERMAL EFFECTS; VACUUM APPLICATIONS;

ULTRAHIGH VACUUM (UHV);

SINGLE CRYSTALS;

EID: 0036526579     PISSN: 10445803     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1044-5803(02)00204-8     Document Type: Conference Paper

References (9)

1. 5 growth on Nb at room temperature
2. The interaction of oxygen with niobium studied by XPS and UPS
3. Kinetic measurements of oxygen dissolution into niobium substrates: In situ X-ray photoelectron spectroscopy studies
4. Oxidation of Nb as studied by the UV-photoemission technique
5. The interaction of oxygen and nitrogen with the niobium (100) surface: II. Reaction kinetics
6. The interaction of oxygen with Nb(110) at 300, 80 and 20 K
7. The interaction of oxygen and nitrogen with the niobium (100) surface: I. Morphology
8. Continuous measurement of surface potential variations during oxygen adsorption on the (100), (110) and (111) faces of niobium using mirror electron microscopy
9. The interaction of oxygen with polycrystalline niobium studied using AES and low-energy SIMS