Growth and characterization of anodic oxidized films in pure water

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 3 A, 2002, Pages 1235-1240

  Ohnishi, Kazunori ^a   Ito, Akira ^a   Takahashi, Yoshihiro ^a   Miyazaki, Syunsuke ^a  

^a NIHON UNIVERSITY   (Japan)

Author keywords

Anodic oxidation; Low temperature process; Silicon dioxide; Thermal annealing

Indexed keywords

ANNEALING; ANODIC OXIDATION; DEPOSITION; ETCHING; SILICA; SURFACE ROUGHNESS; WATER;

ANODIC OXIDIZED FILMS; THERMAL ANNEALING;

FILM GROWTH;

EID: 0036508690     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.1235     Document Type: Article

References (8)