The formation of a (111) texture of the diamond film on Pt/TiO2/SiOx/Si substrate by microwave plasma chemical vapor deposition

Diamond and Related Materials

Volumn 11, Issue 3-6, 2002, Pages 499-503

  Hayashi, Yasuhiko ^a   Matsushita, Yoshinori ^a   Soga, Tetsuo ^a   Umeno, Masayoshi ^a   Jimbo, Takashi ^a  

^a NAGOYA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Diamond growth and characterization; Heteroepitaxial diamond; MPECVD; Pt TiO2 SiOx Si

Indexed keywords

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLATINUM COMPOUNDS; RAMAN SPECTROSCOPY; SUBSTRATES; X RAY DIFFRACTION;

GROWTH TEMPERATURES;

DIAMOND FILMS;

DIAMOND COATING; ELECTRICAL CONDUCTIVITY; FILM; PLASMA TREATMENT; TEXTURE; VAPOR DEPOSITION;

EID: 0036508307     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(02)00021-3     Document Type: Article

References (9)