Growth mechanism of Y123 film by MOD-TFA method

Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals

Volumn 66, Issue 3, 2002, Pages 151-154

  Honjo, Tetsuji ^a   Fuji, Hiroshi ^a   Nakamura, Yuichi ^a   Izumi, Teruo ^a   Shiohara, Yuh ^a   Shibata, Junko ^a   Yamamoto, Takahisa ^a   Ikuhara, Yuichi ^a   Teranishi, Ryo ^a   Yoshimura, Masahiro ^a  

^a SUPERCONDUCTIVITY RESEARCH LABORATORY   (Japan)

Author keywords

Film; Growth mechanism; Metal organic deposition; Trifluoroacetate; YBa2Cu3Oy

Indexed keywords

ANNEALING; CRYSTALLIZATION; DEPOSITION; DIFFUSION; FILM GROWTH; INTERFACES (MATERIALS); QUENCHING; REACTION KINETICS; THICKNESS MEASUREMENT; TRANSMISSION ELECTRON MICROSCOPY;

GROWTH RATE; MULTICOATING METHOD; REACTION INTERFACE;

YTTRIUM COMPOUNDS;

EID: 0036506369     PISSN: 00214876     EISSN: None     Source Type: Journal    
DOI: 10.2320/jinstmet1952.66.3_151     Document Type: Article

References (8)