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Volumn 58, Issue 3, 2002, Pages 248-256
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Factors affecting the quality and corrosion inhibition ability of self-assembled monolayers of a Schiff base
a
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Author keywords
Alternating current impedance; Aqueous corrosion; Copper; Films; Fourier transform infrared reflection spectroscopy; Schiff base; Self assembled monolayers; X ray photoelectron spectroscopy
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Indexed keywords
ADSORPTION;
COPPER;
ELECTRIC IMPEDANCE;
ETCHING;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
MOLECULAR STRUCTURE;
SELF ASSEMBLY;
SURFACE TREATMENT;
X RAY PHOTOELECTRON SPECTROSCOPY;
FOURIER TRANSFORM INFRARED (FTIR) REFLECTION SPECTROSCOPY;
CORROSION PREVENTION;
COPPER;
CORROSION INHIBITOR;
CORROSION RESISTANCE;
FILM;
FOURIER TRANSFORM;
SPECTROSCOPY;
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EID: 0036503045
PISSN: 00109312
EISSN: None
Source Type: Journal
DOI: 10.5006/1.3279876 Document Type: Article |
Times cited : (24)
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References (20)
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