메뉴 건너뛰기




Volumn 58, Issue 3, 2002, Pages 248-256

Factors affecting the quality and corrosion inhibition ability of self-assembled monolayers of a Schiff base

Author keywords

Alternating current impedance; Aqueous corrosion; Copper; Films; Fourier transform infrared reflection spectroscopy; Schiff base; Self assembled monolayers; X ray photoelectron spectroscopy

Indexed keywords

ADSORPTION; COPPER; ELECTRIC IMPEDANCE; ETCHING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MOLECULAR STRUCTURE; SELF ASSEMBLY; SURFACE TREATMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0036503045     PISSN: 00109312     EISSN: None     Source Type: Journal    
DOI: 10.5006/1.3279876     Document Type: Article
Times cited : (24)

References (20)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.