The stoichiometric displacement model and Langmuir and freundlich adsorption

Journal of Chemical Education

Volumn 79, Issue 3, 2002, Pages 385-388

  Geng, Xindu ^a   Zebolsky, Don M ^b  

^a NORTHWEST UNIVERSITY   (China)

^b CREIGHTON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORBENTS; ADSORPTION; ISOTHERMS; LIQUID CHROMATOGRAPHY; MATHEMATICAL MODELS; SOLUTIONS; SOLVENTS;

STOICHIOMETRIC DISPLACEMENT MODEL (SDM);

STOICHIOMETRY;

EID: 0036502294     PISSN: 00219584     EISSN: None     Source Type: Journal    
DOI: 10.1021/ed079p385     Document Type: Article

References (16)