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Volumn 74, Issue 2, 2002, Pages 143-149
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Double-exposure holographic interferometry technique used for characterization of electrodeposited cobalt oxide thin films
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Author keywords
Cobalt oxide; Electrodeposition; Holographic interferometry; Optical absorption; X ray diffraction
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Indexed keywords
ELECTRODEPOSITION;
HOLOGRAPHIC INTERFEROMETRY;
LIGHT ABSORPTION;
STAINLESS STEEL;
SUBSTRATES;
THIN FILMS;
X RAY DIFFRACTION ANALYSIS;
INTERFERENCE FRINGES;
COBALT COMPOUNDS;
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EID: 0036497820
PISSN: 02540584
EISSN: None
Source Type: Journal
DOI: 10.1016/S0254-0584(01)00470-9 Document Type: Article |
Times cited : (15)
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References (19)
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