Investigation of electroplating-induced degradation of PMZNT relaxor ferroelectrics

Journal of the American Ceramic Society

Volumn 85, Issue 2, 2002, Pages 476-478

  Cao, Jiang Li ^a   Li, Long Tu ^a,b   Wang, Yong Li ^a   Gui, Zhi Lun ^a  

^a TSINGHUA UNIVERSITY   (China)

^b AMERICAN CERAMIC SOCIETY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; DEGRADATION; DIELECTRIC MATERIALS; ELECTRIC CONDUCTIVITY; ELECTRON ENERGY LEVELS; ELECTROPLATING; LEAD COMPOUNDS; SURFACE MOUNT TECHNOLOGY;

SCANNING AUGER MICROPROBES (SAM);

FERROELECTRIC CERAMICS;

EID: 0036479062     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1151-2916.2002.tb00114.x     Document Type: Article

References (7)

1. Statistical determination of plating process variables for multilayer ceramics chip capacitors
2. Barrier layer multilayer ceramic capacitor processing: Effects of termination and plating process parameters
3. Hydrogen in electrodeposits: Of decisive importance, but much neglected
4. Lead-based, relaxor ferroelectric ceramics for high performance low firing MLCs
5. Effects of electrochemical hydrogen charging on lead-based relaxor ferroelectric multilayer ceramic capacitors
6. 3-Based ferroelectric capacitors