Plasma impedance in a narrow gap capacitively coupled RF discharge

IEEE Transactions on Plasma Science

Volumn 30, Issue 1 I, 2002, Pages 144-145

  Bera, Kallol ^a   Chen, Che An ^a   Vitello, Peter ^b  

^a APPLIED MATERIALS INC   (United States)

^b PAV Software and Consulting   (United States)

Author keywords

Plasma impedance; Power coupling; Reactance; Resistance; RF capacitively coupled discharge; Sheath thickness; Simulation

Indexed keywords

COMPUTER SIMULATION; ELECTRIC DISCHARGES; ELECTRONS; IMAGE ANALYSIS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA SHEATHS;

PLASMA IMPEDANCES;

PLASMAS;

EID: 0036478235     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2002.1003965     Document Type: Article

References (2)

1. Electrical optimization of plasma-anhanced chemical vapor deposition chamber cleaning plasmas