Particle-in-cell simulation of a neutral beam source for materials processing

IEEE Transactions on Plasma Science

Volumn 30, Issue 1 I, 2002, Pages 110-111

  Hur, Min Sup ^b   Kim, Sung Jin ^b   Lee, Ho Seung ^b   Lee, Jae Koo ^a,b   Yeom, Geun Young ^c  

^a POSTECH ^*

^b Pohang University of Science and Technology (POSTECH)   (South Korea)

^c Sungkyunkwan University   (South Korea)

Author keywords

Neutral beam source; Particle in cell simulation; Plasma materials processing

Indexed keywords

ANISOTROPY; BEAM PLASMA INTERACTIONS; BOUNDARY CONDITIONS; ION BEAMS; MATERIALS SCIENCE; OPTIMIZATION; PLASMA ETCHING; PLASMA SIMULATION;

MATERIALS PROCESSING; NEUTRAL BEAM SOURCES; PLASMA-PROCESS-INDUCED DAMAGES (PPID);

PLASMA SOURCES;

EID: 0036478185     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2002.1003948     Document Type: Article

References (4)

1. Charge damage caused by electron shading effect
2. A source of hyperthermal neutrals for materials processing
3. An object-oriented electromagnetic PIC code
4. Reflection of low-energy hydrogen from solids