Design and evaluation of a minienvironment for semiconductor manufacture processes

Building and Environment

Volumn 37, Issue 2, 2002, Pages 201-208

  Hu, S C ^a   Chuah, Y K ^a   Yen, M C ^a  

^a NATIONAL TAIPEI UNIVERSITY OF TECHNOLOGY   (Taiwan)

Author keywords

Cleanroom; Contamination; Minienvironment; SMIF

Indexed keywords

AMBIENT AIR CONTAMINATION;

COMPUTATIONAL FLUID DYNAMICS; CONTAMINATION; ENVIRONMENTAL IMPACT; FLOW PATTERNS;

SEMICONDUCTOR DEVICE MANUFACTURE;

DESIGN; MANUFACTURING SYSTEM; POLLUTION CONTROL; SEMICONDUCTOR;

EID: 0036467508     PISSN: 03601323     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0360-1323(00)00095-0     Document Type: Article

References (9)

1. Contamination control performance of SMIF isolation technologies in installed production facilities
2. Designing and operating a submicron facility with isolation technology
3. Design consideration for minienvironment cleanrooms (Issues, options, and concepts)
4. High isolation minienvironment for process involving toxic substances
5. The numerical computation of turbulent flow
6. Dispersion and deposition of spherical particles from point sources in a turbulent channel flow