General model to predict and correct errors in phase map interpretation and measurement for out-of-plane ESPI interferometers

Optics and Laser Technology

Volumn 34, Issue 1, 2002, Pages 81-92

  Puga, H J ^a   Rodriguez Vera R ^a   Martinez A ^a  

^a CENTRO DE INVESTIGACIONES EN ÓPTICA   (Mexico)

Author keywords

ESPI; Out of plane; Phase map interpretation; Sensitivity error

Indexed keywords

FINITE ELEMENT METHOD; LIGHTING; MEASUREMENT ERRORS; PHASE MEASUREMENT; SENSITIVITY ANALYSIS; SPECKLE; VECTORS;

ELECTRONIC SPECKLE PATTERN INTERFEROMETRY (ESPI); ILLUMINATION GEOMETRY;

HOLOGRAPHIC INTERFEROMETRY;

EID: 0036467183     PISSN: 00303992     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0030-3992(01)00099-8     Document Type: Article

References (19)

1. Hologram interferometry from a silver halide to silicon and... beyond
2. Evolution of optical interferometry in view of practical applications
3. Fringe pattern analysis methods: Up-to-date review
4. General parameters for the desing and optimization of electronic speckle pattern interferometers
5. Influence of the geometry of illumination and viewing beams on displacement measurement errors in interferometric metrology
6. Estimation of the 2D measurement error introduced by in-plane and out-of-plane electronic speckle pattern interferometry instruments
7. Mapping definition as interface between experimental optical technique and computer modeling for the study of mechanical structures