Perpendicular anisotropy of sputtered Ni films

Journal of Magnetism and Magnetic Materials

Volumn 239, Issue 1-3, 2002, Pages 36-38

  Kohmoto, O ^a   Mineji, N ^a   Isagawa, Y ^a   Ono, F ^a   Kubo, O ^b  

^a OKAYAMA UNIVERSITY   (Japan)

^b TOSHIBA CORPORATION   (Japan)

Author keywords

Coercive force; Ferromangetic resonance; Perpendicular anisotropy; Saturation magnetization; Sputtering

Indexed keywords

COERCIVE FORCE; FERROMAGNETIC RESONANCE; MAGNETIC ANISOTROPY; MAGNETIZATION; NICKEL ALLOYS; PRESSURE EFFECTS; SPUTTERING;

PERMALLOY FILMS;

METALLIC FILMS;

EID: 0036465656     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0304-8853(01)00523-6     Document Type: Article

References (4)