Life is better without non-orthogonal or non-45-degree edges - A practical solution to alleviate the pain on OPC and mask writing

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4754, Issue , 2002, Pages 97-105

  Lynn, Eric C ^a   Chen, Shih Ying ^a  

^a MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; ELECTRON BEAMS; INTEGRATED CIRCUIT LAYOUT; MICROPROCESSOR CHIPS;

OPTICAL PROXIMITY CORRECTION (OPC);

MASKS;

EID: 0036454658     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.476934     Document Type: Article

References (2)

1. M. de Berg, et al. "Computational Geometry-Algorithms and Applications", 2nd Ed., Springer-Verlay 2000, Chapter 14.
2. Functional specification for Calibre DRC and ICRULES, February 1, 2001, Mentor Graphics Cooperation.