A progressive self-learning photomask defect classification

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4754, Issue , 2002, Pages 483-491

  Lynn, Eric C ^a   Chen, Shih Ying ^a   Hsu, Tyng Hao ^b   Hung, Chang Cheng ^b   Lin, Chin Hsiang ^b  

^a MENTOR GRAPHICS CORPORATION   (United States)

^b TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

C (PROGRAMMING LANGUAGE); IMAGE ANALYSIS; LEARNING ALGORITHMS; SENSITIVITY ANALYSIS;

PHOTOMASK DEFECT CLASSIFICATION;

MASKS;

EID: 0036454608     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.477012     Document Type: Article

References (0)