Calibration of test reticles for qualification of imaging properties of microlithographic projection lenses

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4764, Issue , 2002, Pages 142-150

  Haler Grohne W ^a   Hahm, K ^a   Mirande W ^a   Bosse, H ^a   Arnz, M ^b   Zeiss, Carl ^b  

^a PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

^b NONE

Author keywords

[No Author keywords available]

Indexed keywords

CALIBRATION; CARBON; DEPOSITION; ELECTRON BEAMS; INTEGRATED CIRCUIT TESTING; LITHOGRAPHY; MASKS; OPTICAL PROPERTIES; PERFORMANCE; PROJECTION SYSTEMS; QUARTZ; SCANNING ELECTRON MICROSCOPY;

IMAGING PROPERTIES; MICROLITHOGRAPHIC PROJECTION LENSES; OPTICAL TRANSMISSION MICROSCOPY; RETICLES;

LENSES;

EID: 0036442468     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.479346     Document Type: Conference Paper

References (5)

1. Flagello, Donis G.; de Klerk, Jos; Davies, Guy; Rogoff, Richard; Geh, Bernd; Arnz, Michael; Wegmann, Uli; Kraemer, Michael "Towards a comprehensive control of full-field image quality in optical photolithography", Proc. SPIE Vol. 3051, p. 672-685 (1997)
2. H. Bosse, W. Mirandé, C.G. Frase, H.-J. Brück, S. Lehbigk, "Comparison of linewidth measurements on COG masks", Proc. SPIE Vol. 4349-16, (2000)
3. K.P. Schröder et al.: "In quest of nm accuracy: supporting optical metrology by rigourous diffraction theory and AFM topography", Optics Communications 115, 1995, 568-575
4. W. Häßler-Grohne, H. Bosse, "Electron optical metrology system for pattern placement measurements", Meas. Sci. Technol. 9, 1120-1128 (1998)
5. W. H. Brünger, H. Kleinschmidt, W. Häßler-Grohne, H. Bosse: "Contamination reduction in low voltage electron-beam microscopy for dimensional metrology", J. Vac. Sci. Technol. B 15(6), 2181-2184, (1997)