Doubly patternable planarizing lithography with AZ5214E resist for three dimensional processing

Physica Scripta T

Volumn 101, Issue , 2002, Pages 181-184

  Hovinen, Anssi ^a  

^a AALTO UNIVERSITY   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

HETEROJUNCTION BIPOLAR TRANSISTORS; IMAGE ANALYSIS; METALLIZING; MICROELECTROMECHANICAL DEVICES; MICROMETERS; MOSFET DEVICES;

IMAGE REVERSAL MODE;

PHOTORESISTS;

EID: 0036439246     PISSN: 02811847     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (1)

1. Balch, E.W., Weaver, S.E. and Saia R.J., SPIE Optical/Laser Microlithography 922, 387 (1988).