Sputter-deposited TiZrNi high-temperature shape-memory thin films

Materials Science Forum

Volumn 394-395, Issue , 2002, Pages 499-502

  Sawaguchi, T ^a   Sato, M ^a   Ishida, A ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

High Temperature Shape Memory Thin Film; Sputtering Deposition; TiZrNi

Indexed keywords

ANNEALING; COMPOSITION; CRYSTALLIZATION; GRAIN SIZE AND SHAPE; HIGH TEMPERATURE EFFECTS; MAGNETRON SPUTTERING; SPUTTER DEPOSITION; TENSILE STRESS; THIN FILMS; TITANIUM ALLOYS;

AMORPHOUS STATES;

SHAPE MEMORY EFFECT;

EID: 0036430638     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/msf.394-395.499     Document Type: Conference Paper

References (6)

1. T. Sawaguchi, M. Sato, and A. Ishida: Proc. ESOMAT-2000, Como, Italy (2000).
2. T. Sawaguchi, M. Sato, and A. Ishida: Material Science and Engineering A (2001) in press.
3. Krupp GmbH, Essen., Patentschrift DE 4006076 Cl. Fried (1990).
4. S.F. Hsieh and S.K. Wu: Mat. Charact. vol. 41 (1998) p. 151.
5. L. Meisner and V. Sivokha: J. Phys. III vol. 5 (1995) C8-765.
6. V.V. Molokanov, V.N. Chebotnikov, and Yu.K. Kovneristyi: Izv. Akad. Nauk SSSR, vol. 25 (1989) p. 61.