![]() |
Volumn 4691 I, Issue , 2002, Pages 227-239
|
CD vs. pitch across the slit for multiple 248 nm step & scan exposure tools
a
a
ASML
(Netherlands)
|
Author keywords
High NA; Optical Proximity Effects; Tool to tool matching
|
Indexed keywords
ABERRATIONS;
COMPUTER SIMULATION;
IMAGE ANALYSIS;
LIGHT INTERFERENCE;
SCANNING ELECTRON MICROSCOPY;
OPTICAL PROXIMITY CORRECTION (OPC);
PHOTOLITHOGRAPHY;
|
EID: 0036416505
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.474571 Document Type: Conference Paper |
Times cited : (2)
|
References (4)
|