Hopkins vs. Abbé, a lithography simulation matching study

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691 II, Issue , 2002, Pages 1106-1117

  Schlief, Ralph ^a   Liebchen, Armin ^a   Chen, J Fung ^a  

^a ASML US Inc   (United States)

Author keywords

Abb ; Hopkins; Lithography simulation; OPC

Indexed keywords

COMPUTATIONAL METHODS; COMPUTER SIMULATION; EIGENVALUES AND EIGENFUNCTIONS; IMAGING TECHNIQUES; MASKS;

LITHOGRAPHY SIMULATION;

LITHOGRAPHY;

EID: 0036416491     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474491     Document Type: Article

References (5)

1. E. Abbe, "Beiträge zur Theorie des Mikroskops und der mikroskopischen Wahrnehmung," Archly f. Mikroskpische Anat., 9, pp. 413-468, 1873.
2. H.H. Hopkins, "The concept of partial coherence in optics," Proc. Royal Soc. A (London), 208, pp. 263 - 277, 1951.
3. H.H. Hopkins, "On the diffraction theory of optical images," Proc. Royal Soc. A (London), 217, pp. 408 - 432, 1953.
4. A.K. Wong, Resolution Enhancement Techniques in Optical Lithography, p. 45, SPIE Press, Bellingham, WA, 2001.
5. B. Tollkuehn, A. Erdmann, N. Kivel, S.A. Robertson, D. Kang, S.G. Hansen, T. Chiou, A. Fumar-Pici, W. Hoppe, "New methods to calibrate simulation parameters for chemically amplified resists," in A. Yen, Editor, Proceedings of the SPIE, 4691, Paper 4691-126, (2002).