System design of a 157 nm scanner

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691 I, Issue , 2002, Pages 602-612

  Nogawa, Hideki ^a   Hata, Hideo ^a   Kohno, Michio ^a  

^a CANON INC   (Japan)

Author keywords

157 nm; Clocking; Crystal angle; Environment control; Intrinsic birefringence; Lens contamination; Lithography; Partial purge system; Projection optics

Indexed keywords

ABERRATIONS; BIREFRINGENCE; CRYSTALS; EXPOSURE CONTROLS; IMAGE QUALITY; LASERS; OPTICAL INSTRUMENT LENSES; PHOTOLITHOGRAPHY; PROJECTION SYSTEMS; PURGING; SCANNING;

PROJECTION OPTICS; SCANNERS;

OPTICAL DESIGN;

EID: 0036415724     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.474609     Document Type: Conference Paper

References (3)

1. ITRS Proposed 2001 Update.
2. J.H. Burnett, Z.H. Levine and E.L. Shirly:, "Intrinsic Birefringence in 157 nm Materials", The 2nd Int. Symp. on 157 nm Lithography, 2001.
3. Stefan Hien et al., "157 nm Photoresist Outgassing (II)", 2nd International Symposium on 157 nm Lithography, 2001.