Flexible fragmentation rules for next generation OPC-tag prior to fragmentation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691 II, Issue , 2002, Pages 1221-1231

  Chen, Shih Ying ^a   Lynn, Eric C ^a  

^a MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

Data preparation; Layout; OPC

Indexed keywords

ALGORITHMS; COMPUTER SIMULATION; INTEGRATED CIRCUIT LAYOUT; MASKS; TUNING;

OPTICAL PROXIMITY CORRECTION (OPC);

PHOTOLITHOGRAPHY;

EID: 0036415493     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.474503     Document Type: Conference Paper

References (5)

1. N. Cobb, A. Zakhor, "A mathematical and CAD framework for proximity correction", SPIE, 2766, pp. 208-222, 1996. Also the references therein.
2. th Annual Bacus Symposium on Photomask Technology and Management, Proc. "Optimizing proximity correction for wafer fabrication process", SPIE, 2322, pp. 239-246, 1994.
3. Calibre WORKBench and LITHO Commands Reference Manual, Copyright Mentor Graphics Corporation 2001.
4. Shih-Ying Chen and Eric C. Lynn, "Pattern Recognition in the Database of a Mask Layout", accepted by Photomask Japan 2002.
5. It is limited to two adjacent edges, which are the preceding and succeeding edges to the current edge.