CD prediction by threshold energy resist model (TERM)

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691 II, Issue , 2002, Pages 1287-1295

  Yoo, Ji Yong ^a   Kwon, Young Keun ^a   Park, Jun Taek ^a   Sohn, Dong Soo ^a   Kim, Sang Gon ^a   Sohn, Young Su ^a   Oh, Hye Keun ^a  

^a Hanyang University   (South Korea)

Author keywords

Aerial image; Energy threshold resist model; Linearity; Proximity; Resist model; VTRM

Indexed keywords

COMPUTER SIMULATION; IMAGE ANALYSIS; MASKS; SURFACE PROPERTIES;

AERIAL IMAGES;

PHOTORESISTS;

EID: 0036411571     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.474510     Document Type: Conference Paper

References (4)

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3. T.A. Brunner and R.A. Ferguson, "Approximate Models for Resist Process Effects", Proc. SPIE 2726, 198, 1996.
4. J. Garafalo, J. DeMarco, J. Baily, and S. Vaidya, "Reduction of asic Gate-level line-end shortening by mask compensation", Proc. SPIE 2440, 1711, 1995.