Clear field dual alternating phase shift mask lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691 II, Issue , 2002, Pages 999-1008

  Bernard, Douglas A ^a   Li, Jiangwei ^a  

^a SYNOPSYS INC   (United States)

Author keywords

Double exposure; Electronic design automation; Phase shifting mask; Photolithography; Simulation

Indexed keywords

COMPUTER SIMULATION; IMAGING TECHNIQUES; MASKS; PHASE SHIFT;

ALTERNATE PHASE SHIFT MASKS (APSM);

PHOTOLITHOGRAPHY;

EID: 0036411081     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474478     Document Type: Article

References (6)

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3. K.G. Kemp, "Lithographic method using double exposure techniques, mask position shifting and light phase shifting," United States Patent 5,308,741, May 3, 1994.
4. K. Ronse, R. Jonckheere, C. Juffermans, and L. Van den Hove, "Comparison of various phase shift strategies and application to 0.35 um ASIC designs," Proc. SPIE 1927, pp. 2-16, 1993.
5. H. Watanabe, Y.C. Pati and R.F. Pease, "2×2 phase masks for arbitrary pattern formation," Jpn. J. Appl. Phys 33, pp. 6790-6795, 1994.
6. Y.C. Pati, Yao-Ting Wang, Jen-Wei Liang, and T. Kailath, "Phase-shifting masks: automated design and mask requirements," Proc. SPIE 2197, pp. 314-327, 1994.