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Volumn 8, Issue SUPPL. 2, 2002, Pages 60-61

Advances in dual beam TEM sample preparation

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0036408946     PISSN: 14319276     EISSN: None     Source Type: Journal    
DOI: 10.1017/s1431927602101620     Document Type: Conference Paper
Times cited : (7)

References (3)
  • 3
    • 0011165786 scopus 로고    scopus 로고
    • note
    • The author gratefully acknowledges assistance of FEI colleagues Sean Da, Jay Jordan, YC Wang and Richard Young, and collaboration with C. Kisielowski of LBL and S. Rozeveld and E.Beach of DOW Chemical. SiLK is a trademark of the DOW Chemical Company.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.