The effect of dense compression plasma flow on silicon surface morphology

Surface and Coatings Technology

Volumn 158-159, Issue , 2002, Pages 273-276

  Uglov, V V ^a   Anishchik, V M ^a   Astashynski, V V ^a   Astashynski, V M ^b   Ananin, S I ^b   Askerko, V V ^b   Kostyukevich, E A ^b   Kuz'mitski, A M ^b   Kvasov, N T ^c   Danilyuk, A L ^c  

^a BELARUSIAN STATE UNIVERSITY   (Belarus)

^b B I STEPANOV INSTITUTE OF PHYSICS   (Belarus)

^c BELARUSIAN STATE UNIVERSITY OF INFORMATICS AND RADIOELECTRONICS   (Belarus)

Author keywords

Crystallization; Cylindrical structure; Magnetic field; Molten layer; Plasma flow; Silicon

Indexed keywords

COMPACTION; CRYSTALLIZATION; ENERGY ABSORPTION; MAGNETIC FIELDS; MICROSCOPIC EXAMINATION; PHASE TRANSITIONS; SILICON; SURFACES;

MICRORELIEF; SCANNING MICROSCOPY;

PLASMA FLOW;

PLASMA TREATMENT;

EID: 0036394435     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(02)00182-2     Document Type: Article

References (12)