Effect of argon and non-argon ion impingement on stress reduction of multilayers for extreme ultraviolet lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4688, Issue 2, 2002, Pages 516-526

  Shiraishi, Masayuki ^a   Ishiyama, Wakana ^a   Kandaka, Noriaki ^a   Oshino, Tetsuya ^a   Murakami, Katsuhiko ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; COMPRESSIVE STRESS; DOPING (ADDITIVES); INTERDIFFUSION (SOLIDS); INTERFACES (MATERIALS); IONS; LITHOGRAPHY; PARTIAL PRESSURE; STRAIN; TRANSMISSION ELECTRON MICROSCOPY; ULTRAVIOLET RADIATION;

ION-BEAM POLISHING (IBP);

MULTILAYERS;

EID: 0036381633     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.472329     Document Type: Conference Paper

References (8)

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8. K. Murakami and M. Shiraishi, "Stress control of Mo/Si multilayer coatings deposited by ion-beam sputtering," Proc. SPIE 4506, pp. 56-64 (2001).