ASET development of at-wavelength phase-shifting point diffraction interferometer

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4688, Issue 2, 2002, Pages 695-701

  Sugisaki, Katsumi ^a   Zhu, Yucong ^a   Gomei, Yoshio ^a   Niibe, Masahito ^b  

^a EUV Lithography Laboratory   (Japan)

^b UNIVERSITY OF HYOGO   (Japan)

Author keywords

Alignment; EUV lithography; Flare; Foucault test; Interferometry; Optical testing; Phase shifting point diffraction interferometer; Wavefront error

Indexed keywords

DIFFRACTION; INTERFEROMETERS; INTERFEROMETRY; MASKS; OPTICAL TESTING; PHASE SHIFT; ULTRAVIOLET RADIATION; WAVEFRONTS;

EXTREME-ULTRAVIOLET (EUV) RADIATION; PHASE-SHIFTING POINT DIFFRACTION INTERFEROMETERY (PSPDI);

PHOTOLITHOGRAPHY;

EID: 0036381497     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.472344     Document Type: Article

References (7)

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