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Physical Chemistry Chemical Physics

Volumn 4, Issue 15, 2002, Pages 3659-3664

A comparative study of the reactivity of the silicon atom Si(3Pj) towards O2 and NO molecules at very low temperature

(4) Le Picard, S D a Canosa, A a Reignier, D b Stoecklin, T b

a UNIVERSITÉ DE RENNES 1 (France)

b Laboratoire de Physico Chimie Moleculaire (France)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; NITRIC OXIDE; OXYGEN; SILICON;

ARTICLE; ATOM; CALCULATION; COMPARATIVE STUDY; LOW TEMPERATURE; MEASUREMENT; MOLECULE; TEMPERATURE DEPENDENCE;

EID: 0036378426 PISSN: 14639076 EISSN: None Source Type: Journal
DOI: 10.1039/b201374f Document Type: Article

Times cited : (46)

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