F2 laser resist with fluorinated polymers

Journal of Photopolymer Science and Technology

Volumn 15, Issue 4, 2002, Pages 689-692

  Naito, Takuya ^a   Saito, Satoshi ^a   Shida, Naomi ^a   Ushirogouchi, Tohru ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

157 nm; F2 laser resist; Fluorinated polymer; Solubility parameter

Indexed keywords

FLUORINE; POLYMER;

ACIDITY; ARTICLE; CHEMICAL STRUCTURE; DISSOLUTION; EXCIMER LASER; HYDROPHILICITY; LASER; LITHOGRAPHY; OPTICAL DENSITY; SCANNING ELECTRON MICROSCOPY; SOLUBILITY; TECHNOLOGY;

EID: 0036361827     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.15.689     Document Type: Article

References (8)