Ion implantation of UO2

International SAMPE Symposium and Exhibition (Proceedings)

Volumn 47 II, Issue , 2002, Pages 1703-1710

  Meek, Thomas T ^a   Haire, M Jonathan ^a   Tesmer, J ^a   Wetteland, C ^a   Hanrahan, R ^a  

^a University of Tennessee   (United States)

Author keywords

Ceramic materials composites; Electrical and electronic; Resistivity

Indexed keywords

DEPOSITION; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY; ELECTRIC RESISTANCE; ELECTRONIC PROPERTIES; ION IMPLANTATION; POLYCRYSTALLINE MATERIALS;

DOSE LEVELS; ION ENERGIES; VAN DER PAUW FOUR-POINT PROBE TECHNIQUE;

URANIUM DIOXIDE;

EID: 0036351671     PISSN: 08910138     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)

1. 2: Part 1, single crystals
2. Uranium dioxide: Properties and nuclear applications
3. Thermoelectric properties of two ternary tellurides