Resist requirements for electron projection and direct write nanolithography

Materials Research Society Symposium - Proceedings

Volumn 705, Issue , 2002, Pages 23-34

  Ocola, Leonidas E ^a  

^a AGERE SYSTEMS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACIDS; DIFFUSION; ELECTRON BEAM LITHOGRAPHY; ELECTRONS; ETCHING; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; OPTIMIZATION; PHOTOLITHOGRAPHY;

DIRECT WRITE NANOLITHOGRAPHY; ELECTRON PROJECTION NANOLITHOGRAPHY; HIGH-ENERGY ELECTRON; IMAGE FORMATION MODEL;

PHOTORESISTS;

EID: 0036350362     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (11)