A patterned SOI by masked anneal for system-on-chip applications

Materials Research Society Symposium - Proceedings

Volumn 686, Issue , 2002, Pages 53-58

  Cohen, G M ^a   Sadana, D K ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DIFFUSION IN SOLIDS; MASKS; OXIDES; QUENCHING; SILICON ON INSULATOR TECHNOLOGY; THERMOOXIDATION;

SYSTEM ON A CHIP (SOC) TECHNOLOGY;

SILICON WAFERS;

EID: 0036346963     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)