Effects of dummy patterns and substrate on spiral inductors for sub-micron RF ICs

IEEE Radio Frequency Integrated Circuits Symposium, RFIC, Digest of Technical Papers

Volumn , Issue , 2002, Pages 419-422

  Chang, Jae Hong ^a   Youn, Yong Sik ^a   Yu, Hyun Kyu ^a   Kim, Choong Ki ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CODE DIVISION MULTIPLE ACCESS; DOPING (ADDITIVES); EDDY CURRENTS; ELECTRIC INDUCTORS; ELECTRIC LOSSES; ETCHING; PERFORMANCE; POLYSILICON; SUBSTRATES;

RADIO FREQUENCY (RF);

CMOS INTEGRATED CIRCUITS;

EID: 0036317310     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (11)

1. Future directions in silicon IC's for RF personal communications
2. The future of CMOS wireless transceivers
3. High-frequency AC characteristics of 1.5 nm gate oxide MOSFETs
4. Large suspended inductors on silicon and their use in a 2-μm CMOS RF amplifier
5. Improvement of the quality factor of RF integrated inductors by layout optimization
6. On-chip spiral inductors with patterned ground shields for Si-based RF IC's
7. A CMOS 10 GHz voltage controlled LC-oscillator with integrated high-Q inductor
8. Multilevel monolithic inductors in silicon technology
9. A new straightforward calibration and correction procedure for 'on wafer' high-frequency S-parameter measurements (45 MHz - 18 GHz)
10. Experimental study on spiral inductors
11. Modeling of metal and substrate losses in CMOS and BiCMOS inductors for RFICs