Exhaust aerosol of a plasma enhanced CVD system: II. Electrical charging and transport

Aerosol Science and Technology

Volumn 36, Issue 5, 2002, Pages 526-535

  Forsyth, Bruce R ^a   Liu, Benjamin Y H ^a  

^a UNIVERSITY OF MINNESOTA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGED PARTICLES; DEPOSITION; ELECTRIC FIELDS; ELECTRODES; MICROELECTRONICS; NUCLEATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA SHEATHS; POSITIVE IONS; THIN FILMS; VACUUM APPLICATIONS;

ELECTRON CURRENTS; RADIO FREQUENCY (RF) PLASMA; SEMICONDUCTING WAFERS;

AEROSOLS;

NANOPARTICLE; SILICON DIOXIDE;

AEROSOL; EXHAUST EMISSION; FILM; SAMPLING; SEMICONDUCTOR; VAPOR DEPOSITION;

AEROSOL; ARTICLE; ELECTRICITY; ELECTRON; FILM; PRIORITY JOURNAL; RADIOFREQUENCY; SEMICONDUCTOR; SPECTROPHOTOMETRY; VACUUM;

EID: 0036237141     PISSN: 02786826     EISSN: None     Source Type: Journal    
DOI: 10.1080/02786820252883766     Document Type: Article

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