Exhaust aerosol of a plasma enhanced CVD system: I. Size distribution measurements

Aerosol Science and Technology

Volumn 36, Issue 5, 2002, Pages 515-525

  Forsyth, Bruce R ^a   Liu, Benjamin Y H ^a  

^a UNIVERSITY OF MINNESOTA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONDENSATION; DEPOSITION; ELECTRONS; EXHAUST GASES; NUCLEATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; ROTARY PUMPS; SEMICONDUCTOR DEVICE MANUFACTURE; SPECTROMETERS; THIN FILMS; VACUUM APPLICATIONS;

ELECTROSTATIC REPULSIONS; GAS COMPRESSION; PLASMA RADIO FREQUENCY;

AEROSOLS;

NITROGEN; SILICON DIOXIDE;

AEROSOL; EXHAUST EMISSION; FILM; SAMPLING; SEMICONDUCTOR; VAPOR DEPOSITION;

AEROSOL; ARTICLE; ELECTRICITY; FILM; GAS FLOW; GRAVITY; PARTICLE SIZE; PRIORITY JOURNAL; RADIOFREQUENCY; SEMICONDUCTOR; SPECTROPHOTOMETRY; VACUUM; VAPOR;

EID: 0036233170     PISSN: 02786826     EISSN: None     Source Type: Journal    
DOI: 10.1080/02786820252883757     Document Type: Article

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