Experimental verification of the numerical model for a CaF2 crystal growth process

Crystal Research and Technology

Volumn 37, Issue 1, 2002, Pages 77-82

  Molchanov, A ^a,b   Hilburger, U ^a   Friedrich, J ^a   Finkbeiner, M ^a   Wehrhan, G ^a   Mller, G ^a  

^a FRAUNHOFER INSTITUTE FOR INTEGRATED CIRCUITS IIS   (Germany)

^b Schott Lithotec AG   (Germany)

Author keywords

CaF2; Computer simulation; Crystal growth; Diffusion approximation; Heat transfer; Optical materials

Indexed keywords

COMPUTER SIMULATION; CRYSTAL GROWTH; DIFFUSION IN SOLIDS; DISLOCATIONS (CRYSTALS); GRAIN BOUNDARIES; HEAT TRANSFER; OPTICAL MATERIALS; PHOTOLITHOGRAPHY; RADIATION; SINGLE CRYSTALS; TEMPERATURE DISTRIBUTION; THERMAL STRESS;

CALCIUM FLUORIDE; HEAT TRANSPORT;

CALCIUM COMPOUNDS;

EID: 0036216352     PISSN: 02321300     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-4079(200202)37:1<77::AID-CRAT77>3.0.CO;2-K     Document Type: Article

References (4)