Plasmid-mediated arsenical and antimonial resistance determinants (ars) of Pseudomonas sp. KM20

Journal of Microbiology and Biotechnology

Volumn 12, Issue 1, 2002, Pages 31-38

  Yoon, A ^a   Pyo, Kyung ^a  

^a Keimyung University   (South Korea)

Author keywords

Arsenial and antimonial resistance; Efflux; Pseudomonas sp. KM20; Uptake

Indexed keywords

ANION; ANTIMONY DERIVATIVE; ARSENIC; ARSENIC ACID; ARSENIC TRIOXIDE; ARSENITE SODIUM; HEAVY METAL; METAL DERIVATIVE; ORGANOARSENIC DERIVATIVE;

ARTICLE; BACTERIAL GROWTH; BACTERIAL STRAIN; BACTERIUM IDENTIFICATION; BACTERIUM ISOLATION; CELL LEVEL; CHEMICAL ANALYSIS; CISTRON; COAL MINING; CONTROLLED STUDY; ESCHERICHIA COLI; EXPOSURE; GENETIC CODE; INDUCED RESISTANCE; KOREA; MOLECULAR HYBRIDIZATION; NONHUMAN; PLASMID; PSEUDOMONAS; SOUTHERN BLOTTING; TRANSPORT KINETICS;

ESCHERICHIA COLI; PSEUDOMONAS;

EID: 0036210502     PISSN: 10177825     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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