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Volumn 14, Issue 2, 2002, Pages 636-642

Indium - Vanadium oxides deposited by radio frequency sputtering: New thin film transparent materials for Li-insertion electrochemical devices

(8) Artuso, F a,b Decker, F a,b Krasilnikova, A c Liberatore, M a Lourenco, A d Masetti, E c Pennisi, A b,e Simone, F b,e

a SAPIENZA UNIVERSITY OF ROME (Italy)

b INFM (Italy)

c ENEA C R CASACCIA (Italy)

d UNIVERSITY OF CAMPINAS (Brazil)

e UNIVERSITY OF CATANIA (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

INDIUM; LITHIUM; METAL OXIDE; ORTHOVANADIC ACID; VANADIUM DERIVATIVE;

ARTICLE; CRYSTALLIZATION; CYCLIC POTENTIOMETRY; DIFFUSION COEFFICIENT; ELECTROCHEMISTRY; ENERGY; FILM; MATERIALS; OPTICS; RADIOFREQUENCY; SPECTROPHOTOMETRY; X RAY DIFFRACTION;

EID: 0036190994 PISSN: 08974756 EISSN: None Source Type: Journal
DOI: 10.1021/cm010558l Document Type: Article

Times cited : (21)

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