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Volumn 34, Issue 1-3, 2002, Pages 53-61
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A new fabrication technique for photonic crystals: Nanolithography combined with alternating-layer deposition
c
NTT CORPORATION
(Japan)
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Author keywords
Alternating layer deposition; ECR etching; Electron beam lithography; Photonic bandgap; Photonic crystal
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Indexed keywords
BAND STRUCTURE;
DEPOSITION;
ELECTRON BEAM LITHOGRAPHY;
ETCHING;
MULTILAYERS;
NANOTECHNOLOGY;
SPUTTERING;
ALTERNATING-LAYER DEPOSITION;
PHOTONIC CRYSTALS;
CRYSTAL STRUCTURE;
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EID: 0036154373
PISSN: 03068919
EISSN: None
Source Type: Journal
DOI: 10.1023/A:1013326610166 Document Type: Article |
Times cited : (24)
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References (13)
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