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Volumn 34, Issue 1-3, 2002, Pages 53-61

A new fabrication technique for photonic crystals: Nanolithography combined with alternating-layer deposition

Author keywords

Alternating layer deposition; ECR etching; Electron beam lithography; Photonic bandgap; Photonic crystal

Indexed keywords

BAND STRUCTURE; DEPOSITION; ELECTRON BEAM LITHOGRAPHY; ETCHING; MULTILAYERS; NANOTECHNOLOGY; SPUTTERING;

EID: 0036154373     PISSN: 03068919     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1013326610166     Document Type: Article
Times cited : (24)

References (13)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.