Comparison of pulse activation vs conventional light-curing on marginal adaptation of a compomer conditioned using a total-etch or a self-etch technique

Dental Materials

Volumn 18, Issue 1, 2002, Pages 36-48

  Luo, Y ^a   Lo, E C M ^a   Wei, S H Y ^a   Tay, F R ^a  

^a UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

Dental material; Light curing technique; Marginal quality; Restoration

Indexed keywords

CURING; ETCHING; POLYMERIZATION; PROBLEM SOLVING; RESTORATION; SCANNING ELECTRON MICROSCOPY; STATISTICAL METHODS;

LIGHT-CURING TECHNIQUE; MARGINAL QUALITY; NON-RINSE CONDITIONER (NRC); SELF-ETCH TECHNIQUE;

DENTAL MATERIALS;

COMPOMER; DENTIN BONDING AGENT; DENTIN BONDING AGENTS; DYRACT; EPOXY RESIN; MALEIC ACID DERIVATIVE; METHACRYLIC ACID DERIVATIVE; NON RINSE CONDITIONER; NON-RINSE CONDITIONER; PHOSPHORIC ACID; POLYMETHACRYLIC ACID DERIVATIVE; PRIME & BOND NT; SILICATE;

ARTICLE; CEMENTATION; CHEMISTRY; COMPARATIVE STUDY; DENTAL SURGERY; DENTIN; ENAMEL; ENDODONTICS; HISTOLOGY; HUMAN; LIGHT; MATERIALS TESTING; METHODOLOGY; MOLAR TOOTH; NONPARAMETRIC TEST; SCANNING ELECTRON MICROSCOPY; SURFACE PROPERTY; ULTRASTRUCTURE;

ACID ETCHING, DENTAL; COMPARATIVE STUDY; COMPOMERS; DENTAL BONDING; DENTAL CAVITY PREPARATION; DENTAL ENAMEL; DENTAL RESTORATION, PERMANENT; DENTIN; DENTIN-BONDING AGENTS; EPOXY RESINS; HUMAN; LIGHT; MALEATES; MARGINAL ADAPTATION (DENTISTRY); MATERIALS TESTING; METHACRYLATES; MICROSCOPY, ELECTRON, SCANNING; MOLAR; PHOSPHORIC ACIDS; POLYMETHACRYLIC ACIDS; REPLICA TECHNIQUES; SILICATES; STATISTICS; STATISTICS, NONPARAMETRIC; SURFACE PROPERTIES;

EID: 0036134584     PISSN: 01095641     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0109-5641(01)00018-5     Document Type: Article

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