Correlation between microstructure control, density and diffusion barrier properties of TiN(O) films

Microelectronic Engineering

Volumn 60, Issue 1-2, 2002, Pages 81-87

  Alberti, A ^a   Molinaro, S ^b   La Via, F ^a   Bongiorno, C ^a   Ceriola, G ^a   Ravesi, S ^b  

^a CNR IMM   (Italy)

^b STMICROELECTRONICS   (Italy)

Author keywords

Density; Diffusion barrier; Texture; TiN

Indexed keywords

ANNEALING; BIPOLAR TRANSISTORS; DIFFUSION IN SOLIDS; ELECTRIC CONDUCTIVITY; FILM GROWTH; METALLOGRAPHIC MICROSTRUCTURE; SEMICONDUCTING SILICON; SPUTTER DEPOSITION; SUBSTRATES; TITANIUM NITRIDE;

BLANKET FILMS; DIFFUSION BARRIERS; REACTIVE SPUTTERING;

THIN FILMS;

EID: 0036132708     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(01)00583-4     Document Type: Conference Paper

References (7)