Electrochemical etching of shape memory alloy using new electrolyte solutions

Proceedings of the IEEE Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 2002, Pages 376-379

  Mineta, Takashi ^a   Haga, Youichi ^b,c   Esashi, Masayoshi ^b,c  

^a YAMAGATA RESEARCH INSTITUTE OF TECHNOLOGY   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

^c Aza Aoba   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROCHEMISTRY; ELECTROLYSIS; ETCHING; MICROACTUATORS; MICROMACHINING; SEMICONDUCTOR DEVICE MANUFACTURE; SHAPE MEMORY EFFECT;

ELECTROCHEMICAL ETCHING; ETCH FACTOR; ETCHING DEPTH; SHAPE MEMORY ALLOY PIPE; SHAPE MEMORY ALLOY SHEET; SIDE ETCHING WIDTH;

MICROELECTRONIC PROCESSING;

EID: 0036122136     PISSN: 10846999     EISSN: None     Source Type: Journal    
DOI: 10.1109/MEMSYS.2002.984281     Document Type: Article

References (6)