Electron beam process validation for sterilization of complex geometries

Radiation Physics and Chemistry

Volumn 63, Issue 3-6, 2002, Pages 581-586

  Weiss, Douglas E ^a   Cleghorn, Denise A ^b   Nablo, Sam V ^b  

^a 3M COMPANY   (United States)

^b Electron Processing Systems Inc   (United States)

Author keywords

Dosimetry mapping; Dosimetry model correlation; Electron sterilization; Monte Carlo modeling

Indexed keywords

CONTAINERS; GEOMETRY; OPTIMIZATION; PARTICLE BEAM INJECTION; STERILIZATION (CLEANING);

ELECTRON DISINFECTION;

ELECTRON BEAMS;

ANALYTIC METHOD; ARTICLE; DISINFECTION; DOSIMETRY; ELECTRON; ELECTRON BEAM; GEOMETRY; MONTE CARLO METHOD; RADIATION DOSE DISTRIBUTION; RADIATION STERILIZATION; VALIDATION PROCESS;

EID: 0036118634     PISSN: 0969806X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0969-806X(01)00597-7     Document Type: Article

References (8)

1. Overview of the application of nanosecond electron beams for radiochemical sterilization
2. Aseptic packaging machine pre-sterilization and package sterilization: Statistical aspects of microbiological validation
3. Dose distributions for containers electron sterilized at energies from 150-250keV