|
|
Volumn 37, Issue 4, 2002, Pages 323-328
|
|
Chemical deposited Pd on GaAs
|
|
Author keywords
Adhesion measurement; Chemical deposition; GaAs; Palladium
|
|
Indexed keywords
ADHESION;
ANNEALING;
DEPOSITION;
INTERFEROMETRY;
METALLIC FILMS;
OHMIC CONTACTS;
PALLADIUM COMPOUNDS;
REACTION KINETICS;
SEMICONDUCTING GALLIUM ARSENIDE;
SOLUTIONS;
SUBSTRATES;
THICKNESS MEASUREMENT;
FILM THICKNESS;
PALLADIUM CHLORIDE;
PALLADIUM FILM;
REACTION TIME;
SOLUTION CONCENTRATION;
SUBSTRATE CONDUCTIVITY;
PALLADIUM;
|
|
EID: 0036093870
PISSN: 02321300
EISSN: None
Source Type: Journal
DOI: 10.1002/1521-4079(200204)37:4<323::AID-CRAT323>3.0.CO;2-H Document Type: Article |
|
Times cited : (5)
|
|
References (7)
|
