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Volumn 228, Issue 1-2, 2002, Pages 213-225

Preparation, characterization and activity testing of vanadia catalysts deposited onto silica and alumina supports by atomic layer deposition

(4) Keranen J a,b Auroux, A a Ek, S b Niinisto L b

a CNRS (France)

b AALTO UNIVERSITY (Finland)

Author keywords

ALD; Atomic layer deposition; Gas phase preparation; Propane dehydrogenation; Reduction; Supported vanadium oxide; V2O5 dispersion

Indexed keywords

ACIDITY; ADSORPTION; ALUMINA; CALORIMETRY; CATALYST ACTIVITY; CHEMISORPTION; DEHYDROGENATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; NUCLEAR MAGNETIC RESONANCE; PARAMAGNETIC RESONANCE; REDOX REACTIONS; SILICA; SURFACE STRUCTURE; VANADIUM COMPOUNDS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC LAYER DEPOSITION (ALD); TEMPERATURE PROGRAMMED REDUCTION (TPR);

CATALYSTS;

EID: 0036093162 PISSN: 0926860X EISSN: None Source Type: Journal
DOI: 10.1016/S0926-860X(01)00975-9 Document Type: Article

Times cited : (94)

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