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Volumn , Issue , 2002, Pages 98-104

Effects of hot-carrier stress on the RF performance of 0.18 μm technology NMOSFETs and circuits

Author keywords

Hot carriers; Low noise amplifier; NMOSFET; RF CMOS

Indexed keywords

CAPACITORS; CIRCUIT THEORY; DEGRADATION; GATES (TRANSISTOR); HOT CARRIERS; STABILITY; STRESS ANALYSIS; THRESHOLD VOLTAGE; TRANSCONDUCTANCE;

EID: 0036082052     PISSN: 00999512     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (22)

References (23)
  • 11
    • 0032021673 scopus 로고    scopus 로고
    • Hot-carrier effects on the scattering parameters of lightly doped drain n-type metal-oxide-semiconductor field effect transistors
    • special issue. March/April
    • (1998) J. V. Sci. and Technol. , vol.B16 , Issue.2 , pp. 628-632
    • Kwan, W.S.1    Deen, M.J.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.